摘要:
利用已经建成的4 MeV LIA注入器,结合时间分辨测量系统研究了三种测量技术:发射度测量法、无场准直器和磁场准直器测量法.介绍了强流束亮度定义和典型方法理论分析及测量技术的物理概念,提出了用于猝发多脉冲电子束发射度测量装置的设计与调试,通过对时间分辨测量系统的分幅相机记录的光强度分布信息处理,得到电子束束斑均方根半径和发射角,分析某一时刻数据,即可得到电子束某一时刻发射度,从而获得多脉冲电子束时间分辨发射度.在4 MeV LIA注入器上对多脉冲电子束流的发射度进行测量,得到电子束归一化均方根发射度约为114 mm·mrad、双脉冲456 mm·mrad的归一化发射度.最后结合电子束的高斯分布初步分析并给出均方根发射度、实测发射度和边发射度的关系.
Abstract:
This paper presents the principle and methods for measuring brightness of high-density and high-current electron beam.Measurement were performed on a 4 MeV LIA injector with a time-resolved measurement system using three methods:the emittance measurement method,beam collimator without magnetic field method,and beam collimator with magnetic field method.This paper describes the concept of the high current beam brightness and typical theoretic analysis of beam measurement.A time-resolved framing photography has been set up for triple-pulsed beam emittance measuring,which can capture beam divergence image and obtain electron beam root mean square emittance.A series of beam emittance data has been obtained in the 4 MeV LIA injector,the normalized beam emittance is about 114 mm · mrad and the double pulse normalized emittance is 456 mm · mrad.According to the electron beam's Gaussian distribution,a primary analysis is carried out,which gives the numerical relations between beam root mean square emittance,measured emittance and edge emittance.
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