微波化学气相沉积中气压对金刚石薄膜生长速率和质量的影响
The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor deposition
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引用本文: | 李晓红, 郭晚土, 陈学康, 吴敢, 杨建平, 王瑞, 曹生珠, 余荣. 2007: 微波化学气相沉积中气压对金刚石薄膜生长速率和质量的影响, 物理学报, 56(12): 7183-7187. doi: 10.3321/j.issn:1000-3290.2007.12.062 |
Citation: | Li Xiao-Hong, Guo Wan-Tu, Chen Xue-Kang, Wu Gan, Yang Jian-Ping, Wang Rui, Cao Sheng-Zhu, Yu Rong. 2007: The effect of pressure on growth rate and quality of diamond films prepared by microwave plasma chemical vapor deposition, Acta Physica Sinica, 56(12): 7183-7187. doi: 10.3321/j.issn:1000-3290.2007.12.062 |