膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质

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孟蓉, 李红华, 黄志齐. 2005: 膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质, 质谱学报, 26(z1): 5-6,40. doi: 10.3969/j.issn.1004-2997.2005.z1.003
引用本文: 孟蓉, 李红华, 黄志齐. 2005: 膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质, 质谱学报, 26(z1): 5-6,40. doi: 10.3969/j.issn.1004-2997.2005.z1.003
MENG Rong, LI Hong-hua, HUANG Zhi-qi. 2005: Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation, Journal of Chinese Mass Spectrometry Society, 26(z1): 5-6,40. doi: 10.3969/j.issn.1004-2997.2005.z1.003
Citation: MENG Rong, LI Hong-hua, HUANG Zhi-qi. 2005: Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation, Journal of Chinese Mass Spectrometry Society, 26(z1): 5-6,40. doi: 10.3969/j.issn.1004-2997.2005.z1.003

膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质

Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation

  • 摘要: Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses.
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  • 刊出日期:  2005-12-30

膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质

  • 北京化学试剂研究所,北京,100022

摘要: Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses.

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