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分数维方法研究GaAs薄膜中的极化子*
Polaron effect in a GaAs film:the fraction-dimensional space approach?
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摘要: 本文采用分数维方法,在讨论Al0.3Ga0.7As衬底上GaAs薄膜的分数维基础上,计算了GaAs薄膜中的极化子结合能和有效质量.随着薄膜厚度的增加,极化子结合能和质量变化单调地减小.当薄膜厚度Lw<70?A并且衬底厚度Lb<200?A时,衬底厚度的变化对薄膜中极化子的结合能和质量变化的影响比较显著,随着衬底厚度的增加,薄膜中极化子的结合能和质量变化逐渐变大;当薄膜厚度Lw>70?A或者衬底厚度Lb>200?A时,衬底厚度的变化对薄膜中极化子的结合能和质量变化的影响不显著.研究结果为GaAs薄膜电子和光电子器件的研究和应用提供参考.Abstract: Within the framework of the fraction-dimensional space approach, the binding energy and the effective mass of a polaron confined in a GaAs film deposited on Al0.3Ga0.7As substrate have been investigated. It is shown that the polaron binding energy and mass shift decrease monotonously with increasing film thickness. For the film thickness of Lw<70 ?A and the substrate thickness of Lb<200 ?A, the substrate thickness will influence the polaron binding energy and mass shift. The polaron binding energy and mass shift increase with increasing substrate thickness. In the region Lw>70 ?A or Lb>200 ?A, the substrate thickness has no influence on the polaron binding energy and mass shift.
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