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具有大面积均匀性、高质量的大尺寸中阶梯光栅铝膜的研究*
Investigations of high-quality aluminum film with large-area uniformity for large-size echelle grating
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摘要: 大尺寸中阶梯光栅具有大孔径和极高的衍射级次，可以实现普通光栅难以达到的极高光谱分辨率，而制备大面积均匀性的高质量铝膜是实现高性能大尺寸中阶梯光栅的关键因素。本文首次详细报道了具有大面积均匀性、高质量的大尺寸中阶梯光栅铝膜的制备工艺。首先通过理论计算模拟了蒸镀过程中蒸发源的位置、发射特性以及夹具高度对铝膜均匀性的影响，然后研究了关键的蒸发工艺参数，例如蒸发速率、蒸发高度等对铝膜均匀性和铝膜质量的影响，最后在最佳化的蒸发工艺条件下，成功制备出满足大尺寸中阶梯光栅用的在直径700 mm范围内的均匀性小于1%、厚度大于10μm的高质量铝膜。Abstract: Large-size echelle grating can have extremely high spectral resolution due to its large aperture and high diffractive order. To achieve high-performance large-size echelle grating, the preparation of high-quality aluminum film with large-area uniformity is one of the most important factors. In this paper, for the first time so far as we know, we report the preparation process of high-quality aluminum with large-area uniformity in details. First, we simulate theoretically the influence of the position and emission characteristic of the evaporation source, as well as the fixture height, on aluminum film uniformity. Then, we study the influence of some key parameters of the evaporation process (such as the evaporation height and rate) on aluminum film quality and uniformity. Finally, under the optimal conditions, we prepared successfully the high-quality aluminum film with its thickness being larger than 10 μm and uniformity fluctuations less than 1%within a diameter of 700 mm.
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