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非晶氧化钛薄膜形成过程中钛离子能量对表面结构影响的机理
Effect of titanium ion energy on surface structure during the amorphous titanium dioxide film dep osition
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摘要: 研究了非晶氧化钛薄膜沉积过程中入射钛离子能量对表面结构形成机理以及薄膜特性的影响。模拟结果表明，通过提高入射钛离子能量，可以有效降低成膜表面粗糙度，从而减小薄膜表面的光学散射损耗。研究发现，当入射离子能量提高后，薄膜生长模式从“岛”状生长过渡到了“层”状生长，且离子入射点附近的平均扩散系数也有显著增加，这有利于形成更加平整的高质量薄膜表面。Abstract: In this paper, we investigate the influences of the surface structure formation mechanism and the film properties on the incident titanium ion energy in the amorphous TiO2 thin film deposition process. The results show that the surface roughness of the film is reduced by increasing the energy of the incident titanium ions, and then the optical scattering loss of the film surface will decrease. It is also found that when the incident ion energy is increased, the film growth pattern changes from the“island-like”growth to the“layer-like”growth, and the surface diffusion coe?cient of ions near the incident point is also significantly increased, which is conducive to the formation of more smooth film surface.
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