膜去溶进样ICP-MS法测定电子级高纯盐酸中痕量金属杂质
Determination of Trace Metal Elements in Electronic High Purity Hydrochloric Acid by ICP-MS With Membrane Desolvation
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摘要: Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses.Abstract: Determination of thirty four trace metal elements in electronic high purity hydrochloric acid by ICP-MS (Standard Condition, Plasma Screen Condition) with membrane desolvation was described. Matrix effects were compensated by adding rhodium as the internal standard. Detection limits is 0.1 to 100 ng/L; the recovery of the method is 90%-110%. Long term RSD was less than 5%. The results from ICP and ICP-MS are correspondent. ICP-MS improves the accuracy and efficiency of analyses.
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