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ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质

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黄曜, 黄郁芳. 2005: ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质, 质谱学报, 26(z1): 15-16. doi: 10.3969/j.issn.1004-2997.2005.z1.008
引用本文: 黄曜, 黄郁芳. 2005: ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质, 质谱学报, 26(z1): 15-16. doi: 10.3969/j.issn.1004-2997.2005.z1.008
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HUANG Yao, HUANG Yu-fang. 2005: Determination of Metal Impurities in H2O2, HNO3and H2SO4 by ICP-MS, Journal of Chinese Mass Spectrometry Society, 26(z1): 15-16. doi: 10.3969/j.issn.1004-2997.2005.z1.008
Citation: HUANG Yao, HUANG Yu-fang. 2005: Determination of Metal Impurities in H2O2, HNO3and H2SO4 by ICP-MS, Journal of Chinese Mass Spectrometry Society, 26(z1): 15-16. doi: 10.3969/j.issn.1004-2997.2005.z1.008
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ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质

  • 复旦大学材料系,上海,200433

Determination of Metal Impurities in H2O2, HNO3and H2SO4 by ICP-MS

  • 摘要: Inductively coupled plasma mass spectrometry (ICP-MS) was used to detect trace metal impurities in reagents such as H2O2, HNO3and H2SO4. The limit of detection to metal elements can be down to 2-20 ng/L in H2O2 and HNO3 and 0.1-1.0 ng/L in H2SO4.
    Abstract: Inductively coupled plasma mass spectrometry (ICP-MS) was used to detect trace metal impurities in reagents such as H2O2, HNO3and H2SO4. The limit of detection to metal elements can be down to 2-20 ng/L in H2O2 and HNO3 and 0.1-1.0 ng/L in H2SO4.
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  • 刊出日期:  2005-12-30

ICP-MS法分析过氧化氢、硝酸、硫酸中的金属杂质

  • 复旦大学材料系,上海,200433

摘要: Inductively coupled plasma mass spectrometry (ICP-MS) was used to detect trace metal impurities in reagents such as H2O2, HNO3and H2SO4. The limit of detection to metal elements can be down to 2-20 ng/L in H2O2 and HNO3 and 0.1-1.0 ng/L in H2SO4.

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