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Figure 1.  Schematic diagram of the computational models: (a) long anode and (b) short anode. The dashed lines represent four typical locations.

Figure 2.  Energy dependence of secondary-electron yield due to Ar^* and Ar^f impact onto copper surface.

Figure 3.  The 2D electron density distributions for (a) long anode and (b) short anode.

Figure 4.  Comparisons of plasma density variation along the x-direction. The plasma density changes logarithmically.

Figure 5.  Comparisons of y-direction variation of plasma density inside the channels of (a) the whole channel and (b) near the wall.

Figure 6.  The 2D potential distributions of (a) long anode and (b) short anode.

Figure 7.  Schematic diagram of the potential variations versus the x-direction position: (a) the long anode and (b) the short anode. The inset shows the potential variation from the anode inlet to the left boundary.

Figure 8.  Comparisons of y-direction potential variations inside the long and short channels.

Figure 9.  Trajectories of electrons inside the anode channel of (a) long anode and (b) short anode.

Figure 10.  Electron energy distribution functions of zone 1 and zone 2.

Figure 11.  Dependence of electron flux on total kinetic energy: (a) the long anode and (b) the short anode. Negative energy means the electron moves in the negative direction along the x-axis.

Figure 12.  Electron flux distributions below 20 eV: (a) the long anode and (b) the short anode.