利用发射光谱探究CO<sub>2</sub>对MPCVD法生长单晶金刚石质量的影响

伍正新; 满卫东; 贾元波; 范冰庆; 林志东

doi:10.13922/j.cnki.cjvst.202208023

[1]

Widmann C J,Müller-Sebert W,Lang N,et al. Homoepitaxial growth of single crystalline CVD-diamond[J]. Diamond and Related Materials,2016,64:1−7 doi: 10.1016/j.diamond.2015.12.016

[2]

Silva F,Hassouni K,Bonnin X,et al. Microwave engineering of plasma-assisted CVD reactors for diamond deposition[J]. Journal of physics:condensed matter,2009,21(36):364202 doi: 10.1088/0953-8984/21/36/364202

[3]

Huang P,Wang J H,Liu F,et al. Research progress in preparation of mono-crystal diamond by microwave method[J]. Journal of Wuhan Institute of Technology,2016,38(4):357−363 (黄平,汪建华,刘繁,等. 微波法制备单晶金刚石的研究进展[J]. 武汉工程大学学报,2016,38(4):357−363(in chinese) doi: 10.3969/j.issn.1674-2869.2016.04.009 Huang P, Wang J H, Liu F, et al. Research Progress in Preparation of Mono-Crystal Diamond by Microwave Method[J]. Journal of Wuhan Institute of Technology, 2016, 38(04): 357-363 doi: 10.3969/j.issn.1674-2869.2016.04.009

[4]

Vikharev A L,Lobaev M A,Gorbachev A M,et al. Investigation of homoepitaxial growth by microwave plasma CVD providing high growth rate and high quality of diamond simultaneously[J]. Materials Today Communications,2020,22:100816 doi: 10.1016/j.mtcomm.2019.100816

[5]

Gao D,Ma Z B. Two-dimensional expansion of single crystal diamond growth by MPCVD[J]. Journal of Vacuum Science & Technology,2022,42(7):541−546 (高登,马志斌. MPCVD二维扩大生长单晶金刚石[J]. 真空科学与技术学报,2022,42(7):541−546(in chinese) Gao D, Ma Z B. Two-Dimensional Expansion of Single Crystal Diamond Growth by MPCVD[J]. Journal of Vacuum Science & Technology, 2022, 42(07): 541-546

[6]

Gicquel A,Hassouni K,Farhat S,et al. Spectroscopic analysis and chemical kinetics modeling of a diamond deposition plasma reactor[J]. Diamond and Related Materials,1994,3(4-6):581−586 doi: 10.1016/0925-9635(94)90229-1

[7]

Das D,Singh R N,Barney I T,et al. Effect of oxygen on growth and properties of diamond thin film deposited at low surface temperature[J]. Journal of Vacuum Science & Technology A:Vacuum, Surfaces, and Films,2008,26(6):1487−1496

[8]

Tallaire A,Achard J,Silva F,et al. Oxygen plasma pre‐treatments for high quality homoepitaxial CVD diamond deposition[J]. physica status solidi (a),2004,201(11):2419−2424 doi: 10.1002/pssa.200405164

[9]

Zhang Q,Li H D,Cheng S H,et al. The effect of CO₂ on the high-rate homoepitaxial growth of CVD single crystal diamonds[J]. Diamond and related materials,2011,20(4):496−500 doi: 10.1016/j.diamond.2011.02.001

[10]

Richley J C,Kelly M W,Ashfold M N R,et al. Optical emission from microwave activated C/H/O gas mixtures for diamond chemical vapor deposition[J]. The Journal of Physical Chemistry A,2012,116(38):9447−9458 doi: 10.1021/jp306191y

[11]

Liu C,Wang J H,Xiong L W. Effect of CO₂ on MPCVD preparation of diamond film[J]. Vacuum and Cryogenics,2014,20(4):234−238 (刘聪,汪建华,熊礼威. CO₂对MPCVD制备金刚石膜的影响研究[J]. 真空与低温,2014,20(4):234−238(in chinese) doi: 10.3969/j.issn.1006-7086.2014.04.14 Liu C, Wang J H, Xiong L W. Effect of CO2 on MPCVD preparation of diamond film[J]. Vacuum and Cryogenics, 2014, 20(04): 234-238. doi: 10.3969/j.issn.1006-7086.2014.04.14

[12]

Sun Q,Wang J H,Chen Y,et al. The effect of concentration of CO₂ on the structure of diamond films[J]. Vacuum and Cryogenics,2017,23(1):58−62 (孙祁,汪建华,陈义,等. CO₂对金刚石膜结构的影响[J]. 真空与低温,2017,23(1):58−62(in chinese) doi: 10.3969/j.issn.1006-7086.2017.01.011 Sun Q, Wang J H, Chen Y, et al. The Effect of Concentration of CO2 on the Structure of Diamond Films[J]. Vacuum and Cryogenics, 2017, 23(01): 58-62. doi: 10.3969/j.issn.1006-7086.2017.01.011

[13]

Inspektor A,Liou Y,McKenna T,et al. Plasma CVD diamond deposition in CHO systems[J]. Surface and Coatings Technology,1989,39:211−221

[14]

Bougdira J,Remy M,Alnot P,et al. Combined effect of nitrogen and pulsed microwave plasma on diamond growth using CH₄–CO₂ gas mixture[J]. Thin Solid Films,1998,325(1-2):7−13 doi: 10.1016/S0040-6090(97)00955-3

[15]

Achard J,Silva F,Tallaire A,et al. High quality MPACVD diamond single crystal growth: high microwave power density regime[J]. Journal of Physics D:Applied Physics,2007,40(20):6175 doi: 10.1088/0022-3727/40/20/S04

[16]

Mollart T P,Lewis K L. Optical-quality diamond growth from CO₂-containing gas chemistries[J]. Diamond and related materials,1999,8(2-5):236−241 doi: 10.1016/S0925-9635(98)00268-4

[17]

Weng J,Zhou C,Liu F,et al. Influence of the gas flow ratio between CH4 and H2 on the growth of diamond films at high microwave power[J]. Surface Technology,2018,47(11):202−209 (翁俊,周程,刘繁,等. 甲烷与氢气的流量比在高功率下对金刚石膜生长的影响[J]. 表面技术,2018,47(11):202−209(in chinese) doi: 10.16490/j.cnki.issn.1001-3660.2018.11.029 Weng J, Zhou C, Liu F, et al. Influence of the Gas Flow Ratio between CH4 and H2 on the Growth of Diamond Films at High Microwave Power[J]. Surface Technology, 2018, 47(11): 202-209. doi: 10.16490/j.cnki.issn.1001-3660.2018.11.029

[18]

Goyette A N,Lawler J E,Anderson L W,et al. Swan band emission intensity as a function of density[J]. Plasma Sources Science and Technology,1998,7(2):149 doi: 10.1088/0963-0252/7/2/009

[19]

Zhu R H,Liu J L,Chen X L,et al. Research on 1420 cm⁻¹ characteristic peak of free-standing diamond films in raman spectrum[J]. Journal of Synthetic Crystals,2015,44(4):867−871+884 (朱瑞华,刘金龙,陈良贤,等. 金刚石自支撑膜拉曼光谱1420 cm⁻¹特征峰研究[J]. 人工晶体学报,2015,44(4):867−871+884(in chinese) doi: 10.3969/j.issn.1000-985X.2015.04.003 Zhu R H, Liu J L, Chen X L, et al. Research on 1420 cm-1 Characteristic Peak of Free-standing Diamond Films in Raman Spectrum[J]. Journal of Synthetic Crystals, 2015, 44(04): 867-871+884. doi: 10.3969/j.issn.1000-985X.2015.04.003

[20]

Pal K S,Mallik A K,Dandapat N,et al. Microscopic properties of MPCVD diamond coatings studied by micro-Raman and micro-photoluminescence spectroscopy[J]. Bulletin of Materials Science,2015,38(2):537−549 doi: 10.1007/s12034-015-0860-9

[21]

Ye Y Q,Kuang T C,Lei S M,et al. Technique progress in raman spectroscopy characterization of diamond or diamond film[J]. Diamond & Abrasives Engineering,2007(5):17−21 (叶永权,匡同春,雷淑梅,等. 金刚石(膜)的拉曼光谱表征技术进展[J]. 金刚石与磨料磨具工程,2007(5):17−21(in chinese) doi: 10.3969/j.issn.1006-852X.2007.05.005 Ye Y Q, Kuang T C, Lei S M, et al. Technique progress in raman spectroscopy characterization of diamond or diamond film[J]. Diamond & Abrasives Engineering, 2007(05): 17-21. doi: 10.3969/j.issn.1006-852X.2007.05.005

[22]

Li C H,Liao Y,Chang C,et al. Optical emission spectroscopy for hot filament diamond growth process with nitrogen addition[J]. Journal of Inorganic Materials,2001,16(1):6 (李灿华,廖源,常超,等. 氮气氛下金刚石薄膜生长过程中的光发射谱研究[J]. 无机材料学报,2001,16(1):6(in chinese) doi: 10.3321/j.issn:1000-324X.2001.01.013 Li C H, Liao Y, Chang C, et al. Optical Emission Spectroscopy for Hot Filament Diamond Growth Process with Nitrogen Addition[J]. Journal of Inorganic Materials, 2001, 16(1): 6. doi: 10.3321/j.issn:1000-324X.2001.01.013

[23]

Elliott M A,May P W,Petherbridge J,et al. Optical emission spectroscopic studies of microwave enhanced diamond CVD using CH₄/CO₂ plasmas[J]. Diamond and Related Materials,2000,9(3-6):311−316 doi: 10.1016/S0925-9635(99)00196-X

[24]

Cao W,Ma Z B. Optical spectroscopy for high-presure microwave plasma chemical vapor deposition of diamond films[J]. Spectroscopy and Spectral Analysis,2015,35(11):3007−3011 (曹为,马志斌. 高气压MPCVD沉积金刚石的光谱研究[J]. 光谱学与光谱分析,2015,35(11):3007−3011(in chinese) Cao W, Ma Z B. Optical Spectroscopy for High-Presure Microwave Plasma Chemical Vapor Deposition of Diamond Films[J]. Spectroscopy and Spectral Analysis, 2015, 35(11): 3007-3011.