[1] Lee J K, Babaeva N Y, Kim H C, et al. Simulation of capacitively coupled single- and dual-frequency rf discharges[J]. IEEE Transactions on Plasma Science,2004,32(1):47−53 doi: 10.1109/TPS.2004.823975
[2] Makabe T, Petrović Z L. Development of optical computerized tomography in capacitively coupled plasmas and inductively coupled plasmas for plasma etching[J]. Applied Surface Science,2002,192(1):88−114
[3] Godyak V A, Piejak R B, Alexandrovich B M. Ion flux and ion power losses at the electrode sheaths in a symmetrical rf discharge[J]. Journal of Applied Physics,1991,69(6):3455−3460 doi: 10.1063/1.348530
[4] Carl D A, Hess D W, Lieberman M A. Oxidation of silicon in an electron cyclotron resonance oxygen plasma: kinetics, physicochemical, and electrical properties [J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1990, 8(3): 2924-2930
[5] Kitajima M, Kuroki H, Shinno H, et al. Growth of silicon oxide on silicon in the thin film region in an oxygen plasma[J]. Solid State Communications,1992,83(5):385−388 doi: 10.1016/0038-1098(92)90250-D
[6] Chabert P, Braithwaite N. Physics of radio-frequency plasmas [M]. Cambridge: Cambridge University Press, 2011
[7] Li X C, Bao W T, Jia P Y, et al. Characteristics of a large gap uniform discharge excited by DC voltage at atmospheric pressure[J]. Chinese Physics B,2014,23(9):095202−6 doi: 10.1088/1674-1056/23/9/095202
[8] Liu D, Yang A, Wang X, et al. Electron heating and particle fluxes in dual frequency atmospheric-pressure helium capacitive discharge[J]. Journal of Physics D:Applied Physics,2016,49(49):49LT01−7 doi: 10.1088/0022-3727/49/49/49LT01
[9] Han Q, Wu C, Guo Y, et al. Temporal evolution of atmospheric cascade glow discharge with pulsed discharge and radio frequency discharge[J]. Plasma Science and Technology,2020,22(3):034014−11 doi: 10.1088/2058-6272/ab6760
[10] Wang Y H, Liu W, Zhang Y R, et al. Fluid simulation of inductively coupled Ar/O2 plasmas: comparisons with experiment[J]. Chinese Physics B,2015,24(09):095203−8 doi: 10.1088/1674-1056/24/9/095203
[11] Pan G, Tan Z, Pan J, et al. A comparative study on the frequency effects of the electrical characteristics of the pulsed dielectric barrier discharge in He/O2 and in Ar/O2 at atmospheric pressure[J]. Physics of Plasmas,2016,23(4):043508−10 doi: 10.1063/1.4946777
[12] Liu J, Zhang Q Z, Liu Y X, et al. Measurements of ion energy distributions in a dual-frequency capacitively coupled plasma for Ar/O2 discharges[J]. Journal of Physics D:Applied Physics,2013,46(23):235202−8 doi: 10.1088/0022-3727/46/23/235202
[13] Booth J P, Curley G, Marić D, et al. Dual-frequency capacitive rf discharges: effect of low-frequency power on electron density and ion flux[J]. Plasma Sources Science and Technology,2010,19(1):015005−7 doi: 10.1088/0963-0252/19/1/015005
[14] Liu Y, Starostin S A, Peeters F J J, et al. Atmospheric-pressure diffuse dielectric barrier discharges in Ar/O2 gas mixture using 200 kHz/13.56 MHz dual frequency excitation[J]. Journal of Physics D:Applied Physics,2018,51(11):114002−15 doi: 10.1088/1361-6463/aaac73
[15] Magnus F, Gudmundsson J T. Digital smoothing of the langmuir probe I-V characteristic[J]. The Review of scientific instruments,2008,79(7):073503−8 doi: 10.1063/1.2956970
[16] Park J, Henins I, Herrmann H W, et al. Discharge phenomena of an atmospheric pressure radio-frequency capacitive plasma source[J]. Journal of Applied Physics,2001,89(1):20−28 doi: 10.1063/1.1323753
[17] Lymberopoulos D P, Economou D J. Fluid Simulations of glow discharges: effect of metastable atoms in argon[J]. Journal of Applied Physics,1993,73(8):3668−3679 doi: 10.1063/1.352926
[18] Moravej M, Yang X, Hicks R F, et al. A radio-frequency nonequilibrium atmospheric pressure plasma operating with argon and oxygen[J]. Journal of Applied Physics,2006,99(9):093305−6 doi: 10.1063/1.2193647
[19] Lieberman M A, Lichtenberg A J. Principles of plasma discharges and materials processing [M]. John Wiley & Sons, Inc: Hoboken, NJ, USA, 2005
[20] Wang Y N, Cui S Y, Zheng S, et al. Modeling of atmosphere discharge in mixture of nitrogen and oxygen[J]. Frontier of Applied Plasma Technology,2011,4(2):59−64
[21] Jia F, Ishikawa K, Takeda K, et al. Spatiotemporal behaviors of absolute density of atomic oxygen in a planar type of Ar/O2 non-equilibrium atmospheric-pressure plasma jet[J]. Plasma Sources Science & Technology,2014,23(2):025004−7
[22] Li S Z, Huang W T, Zhang J, et al. Optical diagnosis of an argon/oxygen needle plasma generated at atmospheric pressure[J]. Applied Physics Letters,2009,94(11):111501−3 doi: 10.1063/1.3099339
[23] Li S Z, Wu Q, Yan W et al. Influence of oxygen traces on an atmospheric-pressure radio-frequency capacitive argon plasma discharge[J]. Physics of Plasmas,2011,18(10):103502−8 doi: 10.1063/1.3643224
[24] Yu Y Q, Xin Y, Lu W, et al. Investigation of capacitively coupled argon plasma driven by dual-frequency with different frequency configurations[J]. Plasma Science and Technology,2011,13(5):571−574 doi: 10.1088/1009-0630/13/5/12