[1] 王震, 赵志航, 付洋洋 2024 物理学报 73 125201 doi: 10.7498/aps.73.20240392 Wang Z, Zhao Z H, Fu Y Y 2024 Acta Phys. Sin. 73 125201 doi: 10.7498/aps.73.20240392
[2] Wei H C, Wang N, Duan Z C, He F 2018 Phys. Plasmas 25 123513 doi: 10.1063/1.5063450
[3] 邝勇, 章程, 胡修翠, 任晨华, 陈根永, 邵涛 2023 电工技术学报 38 3960 Kuang Y, Zhang C, Hu X C, Ren C H, Chen G Y, Shao T 2023 Trans. Chin. Electrotech. Soc. 38 3960
[4] 郭昱均, 季启政, 何锋, 廖劲松, 张宇, 欧阳吉庭 2019 高电压技术 45 820 Guo Y J, Ji Q Z, He F, Liao J S, Zhang Y, Ouyang J T 2019 High Voltage Eng. 45 820
[5] Saifutdinov A I, Sysoev S S 2023 Plasma Sources Sci. Technol. 32 114001 doi: 10.1088/1361-6595/ad05f6
[6] 赵立芬, 哈静, 王非凡, 李庆, 何寿杰 2022 物理学报 71 025201 doi: 10.7498/aps.71.20211150 Zhao L F, Ha J, Wang F F, Li Q, He S J 2022 Acta Phys. Sin. 71 025201 doi: 10.7498/aps.71.20211150
[7] Schoenbach K H, Kurt B 2016 Eur. Phys. J. D 70 29 doi: 10.1140/epjd/e2015-60618-1
[8] 欧阳吉庭, 张宇, 秦宇 2016 高电压技术 42 673684 Ouyang J T, Zhang Y, Qin Y 2016 High Voltage Eng. 42 673684
[9] Schoenbach K H, El-Habachi A, Shi W, Ciocca M 1997 Plasma Sources Sci. Technol. 6 468 doi: 10.1088/0963-0252/6/4/003
[10] Aubert X, Bauville G, Guillon J, Lacour B, Puech V, Rousseau A 2007 Plasma Sources Sci. Technol. 16 23 doi: 10.1088/0963-0252/16/1/004
[11] Qin Y, He F, Jiang X X, Xie K, Ouyang J T 2014 Phys. Plasmas 21 073501 doi: 10.1063/1.4885640
[12] Qin Y, Xie K, Zhang Y, Ouyang J T 2016 Phys. Plasmas 23 023501 doi: 10.1063/1.4941281
[13] Hsu D D, Graves D B 2003 J. Phys. D: Appl. Phys. 36 2898 doi: 10.1088/0022-3727/36/23/006
[14] Taylan O, Berberoglu H 2014 J. Appl. Phys. 116 043302 doi: 10.1063/1.4891250
[15] Lazzaroni C, Charbrert P 2011 Plasma Sources Sci. Technol. 20 2033
[16] Hagelaar G J M, Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722 doi: 10.1088/0963-0252/14/4/011
[17] Ferreira C M, Loureiro L, Richard A 1985 J. Appl. Phys. 57 82 doi: 10.1063/1.335400
[18] Karoulina E V, Lebedev Y A 1992 J. Phys. D: Appl. Phys. 25 401 doi: 10.1088/0022-3727/25/3/010
[19] Biondi M A 1963 Phys. Rev. 129 1181 doi: 10.1103/PhysRev.129.1181
[20] Shon Jong W, Kushner M J 1994 J. Appl. Phys. 75 1883 doi: 10.1063/1.356334
[21] He S J, Wang P, Ha J, Zhang B M, Zhang Z, Li Q 2018 Plasma Sci. Technol. 20 054006 doi: 10.1088/2058-6272/aab54b
[22] Fu Y Y, Verboncoeur J P, Christlieb A J 2017 Phys. Plasmas 24 103514 doi: 10.1063/1.5004681
[23] Cui R L, He F, Miao J S, Ouyang J T 2017 Phys. Plasmas 24 103524 doi: 10.1063/1.4997262
[24] Chen S, Li K L, Nijdam S 2019 Plasma Sources Sci. Technol. 28 055017 doi: 10.1088/1361-6595/aae554
[25] 高嘉懋 2022 硕士学位论文 (武汉: 华中科技大学) Gao J M. 2022 M. S. Thesis (Wuhan: Huazhong University of Science and Technology
[26] Levko D, Raja L 2021 J. Phys. D: Appl. Phys. 54 235201 doi: 10.1088/1361-6463/abed0a
[27] Arslanbekov R R, Kolobov V I 2003 J. Phys. D: Appl. Phys. 36 2986 doi: 10.1088/0022-3727/36/23/020