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2010 Volume 27 Issue 7
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LI Zhi-Ming, HAO Yue, ZHANG Jin-Cheng, CHEN Chi, CHANG Yong-Ming, XU Sheng-Rui, BI Zhi-Wei. 2010: Optimization and Finite Element Analysis of the Temperature Field in a Nitride MOCVD Reactor by Induction Heating, Chinese Physics Letters, 27(7): 54-57. doi: 10.1088/0256-307X/27/7/070701
Citation: LI Zhi-Ming, HAO Yue, ZHANG Jin-Cheng, CHEN Chi, CHANG Yong-Ming, XU Sheng-Rui, BI Zhi-Wei. 2010: Optimization and Finite Element Analysis of the Temperature Field in a Nitride MOCVD Reactor by Induction Heating, Chinese Physics Letters, 27(7): 54-57. doi: 10.1088/0256-307X/27/7/070701
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Optimization and Finite Element Analysis of the Temperature Field in a Nitride MOCVD Reactor by Induction Heating

  • School of Microelectronics,Xidian University,Xi'an 710071

  • Key Laboratary of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, Xidian University,Xi'an 710071

  • Available Online: 30/07/2010
  • Fund Project: the National Natural Science Foundation of China under Grant Nos 60736033 and 60506020
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通讯作者: 陈斌, bchen63@163.com
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    沈阳化工大学材料科学与工程学院 沈阳 110142

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Optimization and Finite Element Analysis of the Temperature Field in a Nitride MOCVD Reactor by Induction Heating

  • Available Online: 30/07/2010

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