LI Zhi-Ming, JIANG Hai-Ying, HAN Yan-Bin, LI Jin-Ping, YIN Jian-Qin, ZHANG Jin-Cheng. 2012: Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor, Chinese Physics Letters, 29(3): 52-55. doi: 10.1088/0256-307X/29/3/030701
Citation: |
LI Zhi-Ming, JIANG Hai-Ying, HAN Yan-Bin, LI Jin-Ping, YIN Jian-Qin, ZHANG Jin-Cheng. 2012: Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor, Chinese Physics Letters, 29(3): 52-55. doi: 10.1088/0256-307X/29/3/030701
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Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor
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Shandong Provincial Key Laboratory of Network-Based Intelligent Computing, School of Information Science and Engineering, University of Ji'nan, Ji 'nan 250022
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Key Laboratory of Fundamental Science for National on Wide Band-Gap Semiconductor Technology, School of Microelectronics, Xidian University, Xi'an 710071
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Available Online:
30/12/2012
- Fund Project:
the National Natural Science Foundation of China under Grant Nos 60736033 and 60506020
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