2012 Volume 29 Issue 3
Article Contents

LI Zhi-Ming, JIANG Hai-Ying, HAN Yan-Bin, LI Jin-Ping, YIN Jian-Qin, ZHANG Jin-Cheng. 2012: Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor, Chinese Physics Letters, 29(3): 52-55. doi: 10.1088/0256-307X/29/3/030701
Citation: LI Zhi-Ming, JIANG Hai-Ying, HAN Yan-Bin, LI Jin-Ping, YIN Jian-Qin, ZHANG Jin-Cheng. 2012: Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor, Chinese Physics Letters, 29(3): 52-55. doi: 10.1088/0256-307X/29/3/030701

Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor

  • Available Online: 30/12/2012
  • Fund Project: the National Natural Science Foundation of China under Grant Nos 60736033 and 60506020
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Temperature Uniformity of Wafer on a Large-Sized Susceptor for a Nitride Vertical MOCVD Reactor

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