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2019 Volume 27 Issue 2
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Mei-Hua Fang, Peng-Yu Tian, Mao-Dong Zhu, Hong-Ji Qi, Tao Fei, Jin-Peng Lv, Hui-Ping Liu. 2019: Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray, Chinese Physics B, 28(2): 290-294. doi: 10.1088/1674-1056/28/2/024215
Citation: Mei-Hua Fang, Peng-Yu Tian, Mao-Dong Zhu, Hong-Ji Qi, Tao Fei, Jin-Peng Lv, Hui-Ping Liu. 2019: Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray, Chinese Physics B, 28(2): 290-294. doi: 10.1088/1674-1056/28/2/024215
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Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray

  • College of Astronautics, Nanjing University of Aeronautics & Astronautics, Nanjing 210016, China

  • Laboratory of Thin Film Optics, Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Machanics, Chinese Academy of Sciences, Shanghai 201800, China

  • Institute of Modern Physics, Chinese Academy of Sciences, Lanzhou 730000, China

  • Fund Project: the National Natural Science Foundation of China(Grant 11405085)%the Jiangsu Provincial Natural Science Fund, China(Grant BK20130789)
  • Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then b-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm2 to 12 J/cm2, i.e., 50％ increase, after the film has been irradiated by 2.2×1013/cm2 b-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.
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Laser-induced damage threshold in HfO2/SiO2 multilayer films irradiated by β-ray

Abstract: Post-processing can effectively improve the resistance to laser damage in multilayer films used in a high power laser system. In this work, HfO2/SiO2 multilayer films are prepared by e-beam evaporation and then b-ray irradiation is employed as the post-processing method. The particle irradiation affects the laser induced damage threshold (LIDT), which includes defects, surface roughness, packing density and residual stress. The residual stress that is relaxed during irradiation changes from compressive stress into tensile stress. Our results indicate that appropriate tensile stress can improve LIDT remarkably. In view of the fact that LIDT rises from 8 J/cm2 to 12 J/cm2, i.e., 50％ increase, after the film has been irradiated by 2.2×1013/cm2 b-ray, the particle irradiation can be used as a controllable and desirable postprocessing method to improve the resistance to laser induced damage.

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