InSe的高压电输运性质研究*
Electrical transport properties of InSe under high pressure?
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摘要: 高压下对InSe样品进行原位电阻率和霍尔效应测量.电阻率测量结果显示,样品在5—6 GPa区间呈现金属特性,在12 GPa的压力下发生由斜六方体层状结构到立方岩盐矿的结构相变,且具有金属特性.霍尔效应测量结果显示,样品在6.6 GPa由p型半导体转变成n型半导体,电阻率随着压力的升高而逐渐下降是由于载流子浓度升高引起的.Abstract: Electrical resistivity and Hall-effect in InSe under high pressure are accurately measured in situ. The measurement results of electrical resistivity and the temperature dependence of electrical resistivity show that InSe undergoes semiconductor-to-metal transi-tion at 5–6 GPa and transforms from rhombohedral layered phase P1 (InSe-I) to metallic rocksalt cubic phase P3 (InSe-III) at 12 GPa. Certainly, the pressure-induced metallization of InSe results from the pressure-induced structural phase transition. In addition, Hall-effect measurements display the carrier transport behavior of InSe under pressure, which indicates that InSe undergoes a carrier-type inversion around 6.6 GPa and the increases of the carrier concentration is the dominant factor producing the decrease of the resistivity after 9.9 GPa.
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