[1] 戴忠玲, 毛明, 王友年 2006 物理 35 693 doi: 10.3321/j.issn:0379-4148.2006.08.014 Dai Z L, Mao M, Wang Y N 2006 Physics 35 693 doi: 10.3321/j.issn:0379-4148.2006.08.014
[2] Kim S S, Hamaguchi S, Yoon N S, Chang C S, Lee Y D, Ku S H 2001 Phys. Plasmas 8 1384 doi: 10.1063/1.1350671
[3] 谭毅成, 伍尚华, 朱佐祥, 向其军, 朱祖云, 田卓 2018 人工晶体学报 47 1272 Tan Y C, Wu S H, Zhu Z X, Xiang Q J, Zhu Z Y, Tian Z 2018 J. Synth. Cryst. 47 1272
[4] Lieberman M A, Lichtenberg A J 2008 Principles of Plasma Discharges & Materials Processing 11 800 doi: 10.1002/0471724254
[5] Chabert P, Braithwaite N 2011 Physics of Radio-Frequency Plasmas (Cambridge: Cambridge University Press
[6] Lee J K, Manuilenko O V, Babaeva N Y, Kim H C, Shon J W 2005 Plasma Sources Sci. Technol. 14 89 doi: 10.1088/0963-0252/14/1/012
[7] Han L, Kenney J, Rauf S, Korolov I, Schulze J 2023 Plasma Sources Sci. Technol. 32 115018 doi: 10.1088/1361-6595/ad0d06
[8] Kim H H, Shin J H, Lee H J 2023 J. Vac. Sci. Technol. , A 41 023004 doi: 10.1116/6.0002242
[9] Zhou Y, Zhao K, Ma F F, Liu Y X, Gao F, Julian Schulze, Wang Y N 2024 Appl. Phys. Lett. 124 064102 doi: 10.1063/5.0190803
[10] Zhou Y, Zhao K, Ma F F, Sun J Y, Liu Y X, Gao F, Zhang Y R, Wang Y N 2025 Plasma Sources Sci. Technol. 34 035016 doi: 10.1088/1361-6595/adc331
[11] Wang J C, Tian P, Kenney J, Rauf S, Korolov I, Schulze J 2021 Plasma Sources Sci. Technol. 30 075031 doi: 10.1088/1361-6595/ac0da4
[12] Liu J, Zhang Q Z, Liu Y X, Gao F, Wang Y N 2013 J. Phys. D: Appl. Phys. 46 235202 doi: 10.1088/0022-3727/46/23/235202
[13] Hartmann P, Korolov I, Escandon L J, Gennip W V, Buskes K, Schulze J 2022 Plasma Sources Sci. Technol. 31 055017 doi: 10.1088/1361-6595/ac6e05
[14] Hartmann P, Wang L, Nosges K, Berger B, Wilczek S, Brinkmann R P, Mussenbrock T, Juhasz Z, Donko Z, Derzsi A, Lee E, Schulze J 2020 Plasma Sources Sci. Technol. 29 075014 doi: 10.1088/1361-6595/ab9374
[15] Liu G H, Wang X Y, Liu Y X, Sun J Y, Wang Y N 2018 Plasma Sources Sci. Technol. 27 064004 doi: 10.1088/1361-6595/aaca8c
[16] Schulze J, Donko Z, Luggenholscher D, Czarnetzki U 2009 Plasma Sources Sci. Technol. 18 034011 doi: 10.1088/0963-0252/18/3/034011
[17] Takagi S, Chikata T, Sekine M 2021 Jpn. J. Appl. Phys. 60 SAAB07
[18] Donko Z, Schulze J, Hartmann P, Korolov I, Czarnetzki U, Schungel E 2010 Appl. Phys. Lett. 97 081501 doi: 10.1063/1.3481427
[19] Schulze J, Donko Z, Schuengel E, Czarnetzki U 2011 Plasma Sources Sci. Technol. 20 045007 doi: 10.1088/0963-0252/20/4/045007
[20] Saikia P, Bhuyan H, Yap S L, Escalona M, Favre M, Wyndham E, Schulze J 2019 Phys. Plasmas 26 083505 doi: 10.1063/1.5094603
[21] 张钰如, 高飞, 王友年 2021 物理学报 70 095206 doi: 10.7498/aps.70.20202247 Zhang Y R, Gao F, Wang Y N 2021 Acta Phys. Sin. 70 095206 doi: 10.7498/aps.70.20202247
[22] Zhang Y R, Xiang X, Zhao S X, Bogaerts A, Wang Y N 2010 Phys. Plasma 17 113512 doi: 10.1063/1.3519515
[23] Kurokawa M, Kitajima M, Toyoshima K, Kishino T 2011 Phys. Rev. A 84 062717 doi: 10.1103/PhysRevA.84.062717
[24] De Heer F J, Jansen R H J, Van Der Kaay W 1979 J. Phys. B: Atom. Mol. Phys. 12 979 doi: 10.1088/0022-3700/12/6/016
[25] Tachibana K 1986 Phys. Rev. A 34 1007 doi: 10.1103/PhysRevA.34.1007
[26] Rejoub R, Lindsay B G, Stebbings R F 2002 Phys. Rev. A 65 042713 doi: 10.1103/PhysRevA.65.042713
[27] Ali M A, Stone P M 2008 Int. J. Mass Spectrom. 271 51 doi: 10.1016/j.ijms.2007.10.006
[28] Phelps A V, Pitchford L C, Pedoussat C, Donko Z 1999 Plasma Sources Sci. Technol. 8 B1 doi: 10.1088/0963-0252/8/4/401
[29] Brinkmann R P 2007 J. Appl. Phys. 102 093303 doi: 10.1063/1.2772499
[30] Horvath B, Daksha M, Korolov I, Derzsi A, Schulze J 2017 Plasma Sources Sci. Technol. 26 124001 doi: 10.1088/1361-6595/aa963d
[31] Campanell M D, Khrabrov A V, Kaganovich I D 2012 Phys. Rev. Lett. 108 255001 doi: 10.1103/PhysRevLett.108.255001
[32] Campanell M D 2013 Phys. Rev. E 88 033103 doi: 10.1103/PhysRevE.88.033103