[1] Bruggeman P, Leys C 2009 J. Phys. D: Appl. Phys. 42 053001 doi: 10.1088/0022-3727/42/5/053001
[2] 李雪辰, 耿金伶, 贾鹏英, 吴凯玥, 贾博宇, 康鹏程 2018 物理学报 67 075201 doi: 10.7498/aps.67.20172205 Li X C, Geng J L, Jia P Y, Wu K Y, Jia B Y, Kang P C 2018 Acta Phys. Sin. 67 075201 doi: 10.7498/aps.67.20172205
[3] Saifutdinov A I 2022 Plasma Sources Sci. Technol. 31 094008 doi: 10.1088/1361-6595/ac89a7
[4] Richmonds C, Sankaran R M 2008 Appl. Phys. Lett. 93 131501 doi: 10.1063/1.2988283
[5] Foster J E, Kovach Y E, Lai J, Garcia M C 2020 Plasma Sources Sci. Technol. 29 034004 doi: 10.1088/1361-6595/ab7089
[6] Kovačević V V, Sretenović G B, Obradović B M, Kuraica M M 2022 J. Phys. D: Appl. Phys. 55 473002 doi: 10.1088/1361-6463/ac8a56
[7] 杨双越, 温小琼, 杨天元, 李霄 2024 物理学报 73 075203 doi: 10.7498/aps.73.20231881 Yang S Y, Wen X Q, Yang Y T, Li X 2024 Acta Phys. Sin. 73 075203 doi: 10.7498/aps.73.20231881
[8] Jamróz P, Gręda K, Pohl P, Żyrnicki W 2014 Plasma Chem Plasma Process. 34 25 doi: 10.1007/s11090-013-9503-3
[9] Webb M R, Hieftje G M 2009 Anal. Chem. 81 862 doi: 10.1021/ac801561t
[10] Chen Q, Li J S, Li Y F 2015 J. Phys. D: Appl. Phys. 48 424005 doi: 10.1088/0022-3727/48/42/424005
[11] Zheng P C, Liu K M, Wang J M, Dai Y, Yu B, Zhou X J, Hao H G, Luo Y 2012 Appl. Surf. Sci. 259 494 doi: 10.1016/j.apsusc.2012.07.073
[12] Chen Z T, Xu R G, Chen P J, Wang Q 2020 IEEE Trans. Plasma Sci. 48 3455 doi: 10.1109/TPS.2020.3019995
[13] Liang J P, Zhao Z L, Zhou X F, Yang D Z, Yuan H, Wang W C, Qiao J J 2020 Vacuum 181 109644 doi: 10.1016/j.vacuum.2020.109644
[14] Zhang S, Oehrlein G S 2021 J. Phys. D: Appl. Phys. 54 213001 doi: 10.1088/1361-6463/abe572
[15] Vanraes P, Bogaerts A 2021 J. Appl. Phys. 129 220901 doi: 10.1063/5.0044905
[16] Bruggeman P, Ribežl E, Maslani A, Degroote J, Malesevic A, Rego R, Vierendeels J, Leys C 2008 Plasma Sources Sci. Technol. 17 025012 doi: 10.1088/0963-0252/17/2/025012
[17] Shirai N, Suga G, Sasaki K 2020 Plasma Sources Sci. Technol. 29 025007 doi: 10.1088/1361-6595/ab6abc
[18] Shirai N, Ichinose K, Uchida S, Tochikubo F 2011 Plasma Sources Sci. Technol. 20 034013 doi: 10.1088/0963-0252/20/3/034013
[19] Bruggeman P, Liu J J, Degroote J, Kong M G, Vierendeels J, Leys C 2008 J. Phys. D: Appl. Phys. 41 215201 doi: 10.1088/0022-3727/41/21/215201
[20] Xu S F, Zhong X X 2015 Phys. Plasmas 22 103519 doi: 10.1063/1.4934710
[21] Xu S F, Zhong X X 2016 Phys. Plasmas 23 010701 doi: 10.1063/1.4939801
[22] Jia P, Gao K, Zhou S, Chen J Y, Wu J C, Wu K Y, Li X C 2021 Plasma Sources Sci. Technol. 30 095021 doi: 10.1088/1361-6595/abde51
[23] Gao K, Wu K Y, Jia P Y, Jia B Y, Kang P C, Li X C 2019 Phys. Plasmas 26 113501 doi: 10.1063/1.5116063
[24] Zhang S Q, Dufour T 2018 Phys. Plasmas 25 073502 doi: 10.1063/1.5030099
[25] Rumbach P, Lindsay A E, Go D B 2019 Plasma Sources Sci. Technol. 28 105014 doi: 10.1088/1361-6595/ab45e4
[26] Shirai N, Ibuka S, Ishii S 2009 Appl. Phys. Express 2 036001 doi: 10.1143/APEX.2.036001
[27] Yang Z M, Kovach Y, Foster J 2021 J. Appl. Phys. 129 163303 doi: 10.1063/5.0043812
[28] Verreycken T, Bruggeman P, Leys C 2009 J. Appl. Phys 105 083312 doi: 10.1063/1.3117223
[29] Shirai N, Uchida S, Tochikubo F 2014 Plasma Sources Sci. Technol. 23 054010 doi: 10.1088/0963-0252/23/5/054010
[30] Li X C, Kang P C, Gao K, Zhou S, Wu K Y, Jia P Y 2020 Plasma Processes Polym. 17 1900223 doi: 10.1002/ppap.201900223
[31] Kovach Y E, Garcia M C, Foster J E 2021 Plasma Sources Sci. Technol. 30 015007 doi: 10.1088/1361-6595/abc815
[32] Li X C, Zhou S, Gao K, Ran J X, Wu K Y, Jia P Y 2022 IEEE Trans. Plasma Sci. 50 1717 doi: 10.1109/TPS.2022.3156027
[33] Qin X R, Feng B W, Wang R Y, Ma Y P X, Zhang Q, Zhong X X 2024 Plasma Processes Polym. 21 2300055 doi: 10.1002/ppap.202300055
[34] Li X C, Geng J L, Jia P Y, Zhang P P, Zhang Q, Li Y R 2017 Phys. Plasmas 24 113504 doi: 10.1063/1.5010209
[35] Zheng P C, Wang X M, Wang J M, Yu B, Liu H D, Zhang B, Yang R 2014 Plasma Sources Sci. Technol. 24 015010 doi: 10.1088/0963-0252/24/1/015010
[36] Srivastava T, Simeni M S, Nayak G, Bruggeman P J 2022 Plasma Sources Sci. Technol. 31 085010 doi: 10.1088/1361-6595/ac83ed
[37] Shirai N, Uchida S, Tochikubo F, Ishii S 2011 IEEE Trans. Plasma Sci. 39 2652 doi: 10.1109/TPS.2011.2158324
[38] Chen Y F, Feng B W, Zhang Q, Wang R Y, Ostrikov K (Ken), Zhong X X 2020 Plasma Sci. Technol. 22 055404 doi: 10.1088/2058-6272/ab66e9
[39] Li J M, Zhang X, Tian S, Meng T T, Wan W J, Ran J X, Sun H, Jia P Y, Pang X X, Li X C 2025 Phys. Plasmas 32 032107 doi: 10.1063/5.0249081
[40] Ghimire B, Kolobov V I, Xu K G 2023 Phys. Scr. 98 095602 doi: 10.1088/1402-4896/aceb1c
[41] Wu J C, Jia P Y, Ran J X, Chen J Y, Zhang F R, Wu K Y, Zhao N, Ren C H, Yin Z Q, Li X C 2021 Phys. Plasmas 28 073501 doi: 10.1063/5.0047988
[42] Rajzer Y P 1997 Gas Discharge Physicst (Berlin Heidelberg: Springer) p167
[43] Purwins H G, Stollenwerk L 2014 Plasma Phys. Control. Fusion 56 123001 doi: 10.1088/0741-3335/56/12/123001
[44] Trelles J P 2016 J. Phys. D: Appl. Phys. 49 393002 doi: 10.1088/0022-3727/49/39/393002
[45] 陈泽煜, 彭玉彬, 王瑞, 贺永宁, 崔万照 2022 物理学报 71 240702 doi: 10.7498/aps.71.20221385 Chen Z Y, Peng Y B, Wang R, He Y N, Cui W Z 2022 Acta Phys. Sin. 71 240702 doi: 10.7498/aps.71.20221385
[46] 李汉明, 李钢, 李英骏, 李玉同, 张翼, 程涛, 聂超群, 张杰 2008 物理学报 57 0969 doi: 10.7498/aps.57.969 Li H M, Li G, Li Y J, Li Y T, Zhang Y, Cheng T, Nie C Q, Zhang J 2008 Acta Phys. Sin. 57 0969 doi: 10.7498/aps.57.969
[47] 李雪辰, 常媛媛, 刘润甫, 赵欢欢, 狄聪 2013 物理学报 62 165205 doi: 10.7498/aps.62.165205 Li X C, Chang Y Y, Liu R F, Zhao H H, Di C 2013 Acta Phys. Sin. 62 165205 doi: 10.7498/aps.62.165205
[48] Belmonte T, Noël C, Gries T, Martin J, Henrion G 2015 Plasma Sources Sci. Technol. 24 064003 doi: 10.1088/0963-0252/24/6/064003
[49] 张雪雪, 贾鹏英, 冉俊霞, 李金懋, 孙换霞, 李雪辰 2024 物理学报 73 085201 doi: 10.7498/aps.73.20231946 Zhang X X, Jia P Y, Ran J X, Li J M, Sun H X, Li X C 2024 Acta Phys. Sin. 73 085201 doi: 10.7498/aps.73.20231946
[50] Choi J H, Lee T I, Han I, Baik H K, Song K M, Lim Y S, Lee E S 2006 Plasma Sources Sci. Technol. 15 416 doi: 10.1088/0963-0252/15/3/017
[51] Liu Y D, Yan H J, Guo H F, Fan Z H, Wang Y Y, Wu Y, Ren C S 2018 Phys. Plasmas 25 033519 doi: 10.1063/1.5016898
[52] Wu K Y, Liu J N, Wu J C, Chen M, Ran J X, Pang X X, Jia P Y, Li X C, Ren C H 2023 High Volt. 8 1161 doi: 10.1049/hve2.12327
[53] Wu J C, Li X C, Ran J X, Jia H X, Wu K Y, Han G X, Liu J N, Chen J Y, Pang X X, Jia P Y 2023 Plasma Processes Polym. 20 2200188 doi: 10.1002/ppap.202200188